Researchers led by a group from John Hopkins University have knocked down one of at least three major barriers to using ...

News Medical talks to Samuel Penwell and Winfried Wiegraebe at Bruker about how the Vutara VXL enables robust, high-throughput 3D super-resolution via single-molecule localization, pairing bi-plane ...

In EUV lithography, and especially high-numerical-aperture EUV, balancing tradeoffs between resolution, sensitivity and line-width roughness is becoming increasingly difficult. Lithography patterning ...

Optical metasurfaces to perform optical analog spatial differentiation operations and image edge detection processing is a currently hot topic. However, some metasurface differentiators are limited by ...

The equipment, produced by the Netherlands-based ASML, offers a 40 percent improvement in numerical aperture, along with 1.7 ...

SK hynix is the first memory maker to assemble ASML's High-NA EUV lithography system NXE:5200B at its M16 fab in Icheon to use it for R&D of next-generation process technologies before transitioning ...

Extreme Ultraviolet (EUV) system delivers a numerical aperture of 0.55, a 40 percent increase over the previous standard of 0 ...

SK Hynix has become the first memory manufacturer to install ASML’s next-generation High-NA Extreme Ultraviolet (EUV) lithography system.

AMSTERDAM, May 27 (Reuters) - Taiwan Semiconductor Manufacturing Co (2330.TW), the world's largest contract chipmaker, is still assessing when it will use ASML's cutting-edge high numerical aperture ...

This article examines super-resolution laser machining, exploring optical techniques that enable sub-diffraction feature fabrication in precision manufacturing.